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July 21/28, 2008 | ||||||||||||
![]() The multilevel interference lithography technique, which uses MIT's nanoruler, could lead to inexpensive ways of making denser, and therefore faster, computer chips. Research paper: Fabrication of 50 nm Period Gratings with Multilevel Interference Lithography Optics Letters, July 2008 Researchers' homepage: Space Nanotechnology Laboratory Related stories and briefs: Microscope etches ultrathin lines -- a related technique Back to TRN July 21/28, 2008 |
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