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July 21/28, 2008 | ||||||||||||
Lightwaves
usually contain many slightly different wavelengths. Use a soundwave to
spread the wavelengths and you get microscopic parallel lines of dark and
light that can be used to etch extremely fine circuits in computer chips.
The interference pattern method can make 25-nanometer lines spaced 25 nanometers
apart. The circuits in today's computer chips are 65 nanometers wide. The multilevel interference lithography technique, which uses MIT's nanoruler, could lead to inexpensive ways of making denser, and therefore faster, computer chips. Research paper: Fabrication of 50 nm Period Gratings with Multilevel Interference Lithography Optics Letters, July 2008 Researchers' homepage: Space Nanotechnology Laboratory Related stories and briefs: Microscope etches ultrathin lines -- a related technique Back to TRN July 21/28, 2008 |
Research
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